INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "OUT-GASSING HOLE INSIDE ACTIVE AREA TO IMPROVE AP RELIABILITY"

GENEVA, Aug. 12 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/010681) for "OUT-GASSING HOLE INSIDE ACTIVE AREA TO IMPROVE AP RELIABILITY" on Jan 08, 2025. With publication no. WO/2025/165522, the details related to the patent application was published on Aug 07, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): CHEN, Chung-Chia (c/o Applied Materials Taiwan, Ltd.No. 32, R&D Road II, Hsinchu Science ParkHsinchu City, 30076)

Abstract: The present disclosure provides devices, sub-pixels, and methods thereof. The sub-pixel in...