INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "NESTED-LOOP ATOMIC LAYER DEPOSITION WITH INHIBITION AND/OR ETCH"

GENEVA, Dec. 17 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/031589) for "NESTED-LOOP ATOMIC LAYER DEPOSITION WITH INHIBITION AND/OR ETCH" on May 30, 2025. With publication no. WO/2025/254950, the details related to the patent application was published on Dec 11, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): DHAWAN, Sukrant (3050 Bowers AvenueSanta Clara, California 95054), SOMAN, Bhaskar (3050 Bowers AvenueSanta Clara, California 95054), GHOSH, Supriya (3050 Bowers AvenueSanta Clara, California 95054), ROY, Susmit Sing...