INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "METHODS OF MODIFYING OPENINGS IN HARDMASKS AND PHOTORESISTS TO ACHIEVE DESIRED CRITICAL DIMENSIONS"

GENEVA, March 18 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2024/041257) for "METHODS OF MODIFYING OPENINGS IN HARDMASKS AND PHOTORESISTS TO ACHIEVE DESIRED CRITICAL DIMENSIONS" on Aug 07, 2024. With publication no. WO/2025/053940, the details related to the patent application was published on Mar 13, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): NANAYAKKARA, Charith (35 Dory RoadGloucester, Massachusetts 01930), HAUTALA, John (35 Dory RoadGloucester, Massachusetts 01930)

Abstract: A method of modifying an opening in a ...