INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "METHOD FOR FORMING CONFORMAL SILICON OXIDE THIN FILM"

GENEVA, Oct. 1 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/018844) for "METHOD FOR FORMING CONFORMAL SILICON OXIDE THIN FILM" on Mar 07, 2025. With publication no. WO/2025/198871, the details related to the patent application was published on Sep 25, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WANG, Xinke (Applied Materials Singapore Technology Pte Ltd10 Science Park Road, #02-03, The Alpha Science Park IISingapore 117684), BHUYAN, Bhaskar Jyoti (3050 Bowers AvenueSanta Clara, California 95054), CHUA, Thai Cheng (305...