INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "METHOD AND STRUCTURE OF LOW-K SPACER USING POST-TREATMENT FOR MEMORY APPLICATIONS"

GENEVA, Jan. 20 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/027882) for "METHOD AND STRUCTURE OF LOW-K SPACER USING POST-TREATMENT FOR MEMORY APPLICATIONS" on May 06, 2025. With publication no. WO/2026/015190, the details related to the patent application was published on Jan 15, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KANG, Chang Seok (3050 Bowers AvenueSanta Clara, California 95054), MAKALA, Raghuveer Satya (3050 Bowers AvenueSanta Clara, California 95054), FISHBURN, Fredrick (3050 Bowers AvenueSanta Clara, Cal...