INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "METALLIC SOURCE/DRAIN WITH STRESS FOR ADVANCED LOGIC TRANSISTORS"

GENEVA, July 2 -- APPLIED MATERIALS, INC. (3050 Bowers Ave.P.O. Box 58039Santa Clara, California 95054-3299) filed a patent application (PCT/IB2024/062224) for "METALLIC SOURCE/DRAIN WITH STRESS FOR ADVANCED LOGIC TRANSISTORS" on Dec 04, 2024. With publication no. WO/2025/133793, the details related to the patent application was published on Jun 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BREIL, Nicolas (c/o Think Silicon Research and Technology Single Member S.A.Patras Science Park26504 Rion Achaias), COLOMBEAU, Benjamin (c/o Think Silicon Research and Technology Single Member S.A.P...