INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "INTEGRATED PROCESS FOR FORMING SIGE CHANNEL IN NANOSHEET ARCHITECTURES"

GENEVA, Dec. 17 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/031850) for "INTEGRATED PROCESS FOR FORMING SIGE CHANNEL IN NANOSHEET ARCHITECTURES" on Jun 02, 2025. With publication no. WO/2025/254983, the details related to the patent application was published on Dec 11, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SHEPARD, JR., Joseph Francis (3050 Bowers AvenueSanta Clara, California 95054), KUEBLER, Lydia Jane (3050 Bowers AvenueSanta Clara, California 95054), GAIRE, Raman (3050 Bowers AvenueSanta Clara, California 9...