INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "GALLIUM INTRODUCTION FOR CAVITY SHAPING ENGINEERING FOR CMOS DEVICES"

GENEVA, May 19 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2024/050483) for "GALLIUM INTRODUCTION FOR CAVITY SHAPING ENGINEERING FOR CMOS DEVICES" on Oct 09, 2024. With publication no. WO/2025/101306, the details related to the patent application was published on May 15, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BREIL, Nicolas Louis (c/o Applied Materials, Inc., Law Dept., M/S 12693050 Bowers AvenueSanta Clara, California 95054)

Abstract: A method of forming an electrical contact in a semiconductor structure includes...