INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "FORMATION OF SIGE NANOSHEET CHANNELS"

GENEVA, Jan. 13 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/035635) for "FORMATION OF SIGE NANOSHEET CHANNELS" on Jun 27, 2025. With publication no. WO/2026/010817, the details related to the patent application was published on Jan 08, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SHEPARD, JR., Joseph Francis (Applied Materials, Inc.255 Fuller RoadAlbany, New York 12203), KUEBLER, Lydia Jane (Applied Materials, Inc.255 Fuller RoadAlbany, New York 12203), FRONHEISER, Jody A. (Applied Materials, Inc.255 Fuller RoadAlbany...