INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "ELECTRON-STIMULATED ETCHING OF SILICON"

GENEVA, July 3 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2024/060500) for "ELECTRON-STIMULATED ETCHING OF SILICON" on Dec 17, 2024. With publication no. WO/2025/136938, the details related to the patent application was published on Jun 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SHERPA, Sonam Dorje (974 E Arques AvenueApplied Materials Building 81Sunnyvale, California 94085), RANJAN, Alok (1269 Lakeside Dr., Apt. 1097Sunnyvale, California 94085), YANG, Yang (974 E. Arques AvenueSunnyvale, California 94085), RAMASWAM...