GENEVA, May 6 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2024/045781) for "DIOS SPRAY TANK FOR POST CMP SUBSTRATE CLEANING" on Sep 09, 2024. With publication no. WO/2025/090198, the details related to the patent application was published on May 01, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): SAKATA, Clinton P. (c/o Applied Materials, Inc.Law Dept., M/S 12693050 Bowers AvenueSanta Clara, California 95054)
Abstract:
Embodiments of the disclosure provided herein include an apparatus and method for processing a substrate ...