INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "DEPOSITION OF RESIST UNDERLAYER WITH REDUCED SP2 CARBON CONTENT"

GENEVA, Aug. 26 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/015453) for "DEPOSITION OF RESIST UNDERLAYER WITH REDUCED SP2 CARBON CONTENT" on Feb 12, 2025. With publication no. WO/2025/174785, the details related to the patent application was published on Aug 21, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): RATHI, Sudha (c/o Applied Materials, Inc., Law Dept., M/S 12693050 Bowers AvenueSanta Clara, California 95054), JOSHI, Unnati (c/o Applied Materials, Inc., Law Dept., M/S 12693050 Bowers AvenueSanta Clara, Californi...