INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "COOLED SPUTTERING TARGET FOR ION SOURCE"

GENEVA, Feb. 18 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054-3299) filed a patent application (PCT/US2024/038648) for "COOLED SPUTTERING TARGET FOR ION SOURCE" on Jul 19, 2024. With publication no. WO/2025/034384, the details related to the patent application was published on Feb 13, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): NOKED, Ori (c/o Applied Materials, Inc.35 Dory RoadGloucester, Massachusetts 01930)

Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The target holder is mounted to a shaft, which may b...