GENEVA, Oct. 28 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/023458) for "CONTROLLED ETCH OF SILICON NITRIDE MATERIAL" on Apr 07, 2025. With publication no. WO/2025/221496, the details related to the patent application was published on Oct 23, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): SHERPA, Sonam Dorje (3050 Bowers AvenueSanta Clara, California 95054), RANJAN, Alok (3050 Bowers AvenueSanta Clara, California 95054)
Abstract: Exemplary semiconductor processing methods may include flowing a fluorine-containing precu...