GENEVA, Dec. 31 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2025/033148) for "CHEMICAL MECHANICAL POLISHER CLEANING UNIT" on Jun 11, 2025. With publication no. WO/2025/264447, the details related to the patent application was published on Dec 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SAKATA, Clinton (c/o Applied Materials, Inc., Law Dept., M/S 12693050 Bowers AvenueSanta Clara, California 95054)

Abstract: A rotating substrate support for use in a substrate processing system includes a cylindrical shaped outer hub h...