INTERNATIONAL PATENT: APPLIED MATERIALS, INC. FILES APPLICATION FOR "ATOMIC LAYER ETCHING OF SILICON OXIDE AT CRYOGENIC TEMPERATURE"

GENEVA, July 3 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054) filed a patent application (PCT/US2024/056822) for "ATOMIC LAYER ETCHING OF SILICON OXIDE AT CRYOGENIC TEMPERATURE" on Nov 21, 2024. With publication no. WO/2025/136581, the details related to the patent application was published on Jun 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SHERPA, Sonam Dorje (c/o Applied Materials, Inc., Law Dept., M/S 12693050 Bowers AvenueSanta Clara, California 95054), ABDULLA AL GALIB, Mir (c/o Applied Materials, Inc., Law Dept., M/S 12693050 Bowers AvenueSanta Cla...