GENEVA, April 1 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054-3299) filed a patent application (PCT/US2024/039573) for "ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES" on Jul 25, 2024. With publication no. WO/2025/064054, the details related to the patent application was published on Mar 27, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): ROWLAND, Christopher A. (c/o Applied Materials, Inc.35 Dory RoadGloucester, Massachusetts 01930)
Abstract:
A plasma source having an adjustable exit aperture is disclosed. The plasma source has a cylindrical bod...