INTERNATIONAL PATENT: APPLIED MATERIALS, INC., WAYNE STATE UNIVERSITY FILES APPLICATION FOR "ATOMIC LAYER DEPOSITION OF MOLYBDENUM SILICIDE THIN FILMS"

GENEVA, Nov. 11 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054), WAYNE STATE UNIVERSITY (5057 WoodwardDetroit, Michigan 48202) filed a patent application (PCT/US2025/026315) for "ATOMIC LAYER DEPOSITION OF MOLYBDENUM SILICIDE THIN FILMS" on Apr 25, 2025. With publication no. WO/2025/230819, the details related to the patent application was published on Nov 06, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KNISLEY, Thomas Joseph (3050 Bowers AvenueSanta Clara, California 95054), BEH, Daniel Wei Ming (Wayne State University5057 WoodwardDetroit, Michigan 48202), D...