INTERNATIONAL PATENT: APPLIED MATERIALS, INC., HEYMANNS, MATTHIAS, SCHEER, EVELYN, HOFMANN, ANNABELLE, SCHAFER, MARIO, ANJIKI, TAKASHI FILES APPLICATION FOR "EVAPORATION SOURCE ARRANGEMENT, SHIELD ARRANGEMENT AND METHOD OF COATING A SUBSTRATE"

GENEVA, Feb. 2 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054), HEYMANNS, Matthias (Im Seerich 3764839 Munster), SCHEER, Evelyn (Saalburgring 1163486 Bruchkoebel), HOFMANN, Annabelle (HubnerwaldstraBe 1463811 Stockstadt), SCHAFER, Mario (Am Rosengarten 2663674 Altenstadt), ANJIKI, Takashi (GrunewaldstraBe 563739 Aschaffenburg) filed a patent application (PCT/IB2024/057174) for "EVAPORATION SOURCE ARRANGEMENT, SHIELD ARRANGEMENT, AND METHOD OF COATING A SUBSTRATE" on Jul 24, 2024. With publication no. WO/2026/022511, the details related to the patent application was published on Jan 29, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is manage...