INTERNATIONAL PATENT: APPLIED MATERIALS, INC., FANG, JEN-YU FILES APPLICATION FOR "ADJUSTING EFFECTIVE DEPTH OF FOCUS"

GENEVA, July 14 -- APPLIED MATERIALS, INC. (3050 Bowers AvenueSanta Clara, California 95054), FANG, Jen-Yu (Room 102, Building No. 12, Lane 650 Biyun RoadPudong New Area, Shanghai 201206) filed a patent application (PCT/CN2024/070896) for "ADJUSTING EFFECTIVE DEPTH OF FOCUS" on Jan 05, 2024. With publication no. WO/2025/145439, the details related to the patent application was published on Jul 10, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SIM, Kim Seong (31 Kim Keat Lane #14-01Singapore 328882), KIM, Jong Yun (Hwaseong-si Gyeonggi-do), FANG, Jen-Yu (Room 102, Building No. 12, Lane 650 ...