INTERNATIONAL PATENT: AMAZON TECHNOLOGIES, INC. FILES APPLICATION FOR "LARGE LANGUAGE MODEL (LLM)-BASED CORRECTION BASED ON A MULTI-TOOL PROMPT"

GENEVA, March 26 -- AMAZON TECHNOLOGIES, INC. (PO Box 81226Seattle, Washington 98108-1226) filed a patent application (PCT/US2024/046278) for "LARGE LANGUAGE MODEL (LLM)-BASED CORRECTION BASED ON A MULTI-TOOL PROMPT" on Sep 11, 2024. With publication no. WO/2025/059235, the details related to the patent application was published on Mar 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): PISKALA, Deepak Babu Rajaram (410 Terry Avenue NorthSeattle, Washington 98109-5210)

Abstract: Techniques for large language model (LLM)-based correction based on a multi-tool prompt are described. In an ex...