INTERNATIONAL PATENT: ALIGN TECHNOLOGY, INC. FILES APPLICATION FOR "RECOVERY OF HYDROXYL-CONTAINING COMPOUNDS AND (METH)ACRYLATE MONOMERS FROM 3D PRINTED POLYMERIC MATERIAL"

GENEVA, Dec. 31 -- ALIGN TECHNOLOGY, INC. (2820 Orchard ParkwaySan Jose, California 95134) filed a patent application (PCT/US2025/033831) for "RECOVERY OF HYDROXYL-CONTAINING COMPOUNDS AND (METH)ACRYLATE MONOMERS FROM 3D PRINTED POLYMERIC MATERIAL" on Jun 16, 2025. With publication no. WO/2025/264582, the details related to the patent application was published on Dec 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): WANG, Xiance (c/o Align Technology, Inc.2820 Orchard ParkwaySan Jose, California 95134), CHANG, Jian (c/o Align Technology, Inc.2820 Orchard ParkwaySan Jose, California 95134),...