INTERNATIONAL PATENT: ALIGN TECHNOLOGY, INC., KESCHMANN, MARC FILES APPLICATION FOR "RESIN COMPOSITION FOR A RADIATION-CURING ADDITIVE MANUFACTURING PROCESS, PARTICULARLY FOR A LITHOGRAPHIC MANUFACTURING PROCESS"

GENEVA, Nov. 24 -- ALIGN TECHNOLOGY, INC. (2820 Orchard ParkwaySan Jose, California 95134), KESCHMANN, Marc (Riemergasse 141010 Wien) filed a patent application (PCT/EP2025/063281) for "RESIN COMPOSITION FOR A RADIATION-CURING ADDITIVE MANUFACTURING PROCESS, PARTICULARLY FOR A LITHOGRAPHIC MANUFACTURING PROCESS" on May 14, 2025. With publication no. WO/2025/238104, the details related to the patent application was published on Nov 20, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): FRANK, Christian (Knotzenbachgasse 1/291230 Wien), GORSCHE, Christian (Dr. Karl Renner-Platz 77210 Mattersburg)...