INTERNATIONAL PATENT: AIXTRON SE FILES APPLICATION FOR "METHOD AND DEVICE FOR DEPOSITING A III-V SEMICONDUCTOR LAYER IN A PROCESS CHAMBER HAVING A SURFACE COATED WITH A III-V PROTECTIVE LAYER"

GENEVA, June 2 -- AIXTRON SE (Dornkaulstr. 252134 Herzogenrath) filed a patent application (PCT/EP2024/082835) for "METHOD AND DEVICE FOR DEPOSITING A III-V SEMICONDUCTOR LAYER IN A PROCESS CHAMBER HAVING A SURFACE COATED WITH A III-V PROTECTIVE LAYER" on Nov 19, 2024. With publication no. WO/2025/108931, the details related to the patent application was published on May 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MICCOLI, Ilio (Maubacher Str. 5452134 Herzogenrath), SIMKUS, Gintautas (Urbanstr. 4152080 Aachen)

Abstract: The invention relates to a method for depositing a III-V semi...