GENEVA, Nov. 10 -- AIXTRON SE (Dornkaulstr. 252134 Herzogenrath) filed a patent application (PCT/EP2025/062092) for "METHOD AND DEVICE FOR CLEANING A CVD REACTOR" on May 02, 2025. With publication no. WO/2025/229194, the details related to the patent application was published on Nov 06, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): DEBALD, Arne Lars (Nieuwstraat 1776461KB Kerkrade), MAUDER, Christof Martin (Am Branderhof 3552066 Aachen), MEYER, Dominik (Schlossstr. 3452066 Aachen)
Abstract: The invention relates to a device and a method for depositing semiconductor layers in a process cha...