GENEVA, May 27 -- AGFA-GEVAERT NV (Septestraat 272640 Mortsel) filed a patent application (PCT/EP2024/082292) for "AN ETCH RESIST INKJET INK" on Nov 14, 2024. With publication no. WO/2025/104145, the details related to the patent application was published on May 22, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): CORTES SALAZAR, Fernando (Septestraat 272640 Mortsel), LOCCUFIER, Johan (Septestraat 272640 Mortsel)
Abstract:
An etch resist inkjet ink comprising: - one or more photoinitiators, wherein at least one photoinitiator is a thioxantone compound, - one or more acrylamides according t...