GENEVA, June 10 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), ＡＧＣ株式会社 (東京都千代田区丸の内一丁目５番１号) filed a patent application (PCT/JP2024/036841) for "REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK" on Oct 16, 2024. With publication no. WO/2025/115437, the details related to the patent application was published on Jun 05, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): SEI Ryosuk...