INTERNATIONAL PATENT: AGC INC., ＡＧＣ株式会社 FILES APPLICATION FOR "REFLECTIVE MASK BLANK, METHOD FOR PRODUCING REFLECTIVE MASK BLANK, REFLECTIVE MASK AND METHOD FOR PRODUCING REFLECTIVE MASK"

GENEVA, April 7 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), ＡＧＣ株式会社 (東京都千代田区丸の内一丁目５番１号) filed a patent application (PCT/JP2024/029976) for "REFLECTIVE MASK BLANK, METHOD FOR PRODUCING REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING REFLECTIVE MASK" on Aug 23, 2024. With publication no. WO/2025/069822, the details related to the patent application was published on Apr 03, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organ...