GENEVA, July 14 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), ＡＧＣ株式会社 (東京都千代田区丸の内一丁目５番１号) filed a patent application (PCT/JP2024/046278) for "REFLECTION-TYPE MASK BLANK, REFLECTION-TYPE MASK, AND METHOD FOR PRODUCING REFLECTION-TYPE MASK" on Dec 26, 2024. With publication no. WO/2025/146811, the details related to the patent application was published on Jul 10, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s):...