GENEVA, Dec. 16 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), ＡＧＣ株式会社 (東京都千代田区丸の内一丁目５番１号) filed a patent application (PCT/JP2025/018191) for "REFLECTION MASK BLANK, REFLECTION MASK, AND METHOD FOR PRODUCING REFLECTION MASK" on May 20, 2025. With publication no. WO/2025/253899, the details related to the patent application was published on Dec 11, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): NAKANISHI Eita...