INTERNATIONAL PATENT: AGC INC., ＡＧＣ株式会社 FILES APPLICATION FOR "POLISHING AGENT AND METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING POLISHING AGENT ADDITIVE LIQUID, POLISHING METHOD AND METHOD FOR PRODUCING SEMICONDUCTOR COMPONENT"

GENEVA, Feb. 4 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), ＡＧＣ株式会社 (東京都千代田区丸の内一丁目５番１号) filed a patent application (PCT/JP2024/025077) for "POLISHING AGENT AND METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING POLISHING AGENT ADDITIVE LIQUID, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR COMPONENT" on Jul 11, 2024. With publication no. WO/2025/023040, the details related to the patent application was published on Jan 30, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is manage...