INTERNATIONAL PATENT: AGC INC., ＡＧＣ株式会社 FILES APPLICATION FOR "POLISHING AGENT, ADDITIVE LIQUID FOR POLISHING AGENT, POLISHING METHOD AND METHOD FOR PRODUCING SEMICONDUCTOR COMPONENT"

GENEVA, Dec. 16 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), ＡＧＣ株式会社 (東京都千代田区丸の内一丁目５番１号) filed a patent application (PCT/JP2025/019465) for "POLISHING AGENT, ADDITIVE LIQUID FOR POLISHING AGENT, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR COMPONENT" on May 29, 2025. With publication no. WO/2025/254017, the details related to the patent application was published on Dec 11, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organizat...