GENEVA, June 11 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), AGC株式会社 (東京都千代田区丸の内一丁目5番1号) filed a patent application (PCT/JP2024/041161) for "CLEANING LIQUID, CLEANING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT" on Nov 20, 2024. With publication no. WO/2025/115729, the details related to the patent application was published on Jun 05, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): IWAMOTO Hi...