INTERNATIONAL PATENT: AETHER, INC., 주식회사 이서 FILES APPLICATION FOR "METHOD FOR DETERMINING OR PREDICTING STATE OF CHAMBER, METHOD FOR CORRECTING MEASUREMENT ERROR IN CHAMBER AND APPARATUS FOR MONITORING STATE OF CHAMBER"

GENEVA, July 14 -- AETHER, INC. (4F, 49 Techno 8-ro,Yuseong-gu,Daejeon 34028), 주식회사 이서 (대전광역시유성구테크노8로 49, 4층) filed a patent application (PCT/KR2024/021012) for "METHOD FOR DETERMINING OR PREDICTING STATE OF CHAMBER, METHOD FOR CORRECTING MEASUREMENT ERROR IN CHAMBER, AND APPARATUS FOR MONITORING STATE OF CHAMBER" on Dec 24, 2024. With publication no. WO/2025/147002, the details related to the patent application was published on Jul 10, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organizatio...