INTERNATIONAL PATENT: ADVANCED ENERGY INDUSTRIES, INC. FILES APPLICATION FOR "PLASMA PROCESSING BIAS CONTROL BASED ON IMPEDANCE"

GENEVA, Sept. 10 -- ADVANCED ENERGY INDUSTRIES, INC. (1595 Wynkoop StreetSuite 800Denver, Colorado 80202) filed a patent application (PCT/US2025/017119) for "PLASMA PROCESSING BIAS CONTROL BASED ON IMPEDANCE" on Feb 25, 2025. With publication no. WO/2025/184051, the details related to the patent application was published on Sep 04, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SHAW, Denis (c/o Advanced Energy Industries, Inc.1595 Wynkoop Street, Suite 800Denver, Colorado 80202), CARTER, Daniel (c/o Advanced Energy Industries, Inc.1595 Wynkoop Street, Suite 800Denver, Colorado 80202)

Abstr...