INTERNATIONAL PATENT: ACM RESEARCH (SHANGHAI),INC., 盛美半导体设备（上海）股份有限公司 FILES APPLICATION FOR "SUBSTRATE TREATMENT METHOD"

GENEVA, Jan. 4 -- ACM RESEARCH (SHANGHAI) , INC. (BUILDING 4, NO. 1690 CAI LUN ROAD, CHINA (SHANGHAI) PILOT FREE TRADE ZONEPudong New Area, Shanghai 201203), 盛美半导体设备（上海）股份有限公司 (中国上海市浦东新区中国（上海）自由贸易试验区蔡伦路1690号第4幢) filed a patent application (PCT/CN2025/097613) for "SUBSTRATE TREATMENT METHOD" on May 28, 2025. With publication no. WO/2026/001515, the details related to the patent application was published on Jan 02, 2026.

Notably, th...