INTERNATIONAL PATENT: 3M INNOVATIVE PROPERTIES COMPANY FILES APPLICATION FOR "NANOPARTICLE-FILLED MASKS FOR REACTIVE ION ETCHING SILICON AND METHODS THEREOF"

GENEVA, Feb. 9 -- 3M INNOVATIVE PROPERTIES COMPANY (3M CenterPost Office Box 33427Saint Paul, Minnesota 55133-3427) filed a patent application (PCT/IB2025/055137) for "NANOPARTICLE-FILLED MASKS FOR REACTIVE ION ETCHING SILICON AND METHODS THEREOF" on May 16, 2025. With publication no. WO/2026/027951, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): TIU, Brylee David B. (3M CenterPost Office Box 33427Saint Paul, Minnesota 55133-3427), BEDOYA, Cedric (3M CenterPost Office Box 33427Saint Paul, Minnesota 55133-3427), VAN LENGE...