INTERNATIONAL PATENT: 3M INNOVATIVE PROPERTIES COMPANY FILES APPLICATION FOR "A HIGH PARTICLE LOADED THIN FILM FOR USE AS A REACTIVE ION ETCHING MASK AND METHODS THEREOF"

GENEVA, Feb. 9 -- 3M INNOVATIVE PROPERTIES COMPANY (3M CenterPost Office Box 33427Saint Paul, Minnesota 55133-3427) filed a patent application (PCT/IB2025/055283) for "A HIGH PARTICLE LOADED THIN FILM FOR USE AS A REACTIVE ION ETCHING MASK AND METHODS THEREOF" on May 21, 2025. With publication no. WO/2026/027952, the details related to the patent application was published on Feb 05, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): TIU, Brylee David B. (3M CenterPost Office Box 33427Saint Paul, Minnesota 55133-3427), BEDOYA, Cedric (3M CenterPost Office Box 33427Saint Paul, Minnesota 55133-342...