INTERNATIONAL PATENT: RHEON AUTOMATIC MACHINERY CO., LTD., レオン自動機株式会社 FILES APPLICATION FOR "METHOD FOR ADJUSTING WIDTH OF FOOD DOUGH"

GENEVA, Dec. 30 -- RHEON AUTOMATIC MACHINERY CO., LTD. (2-3, Nozawa-machi, Utsunomiya-shi, Tochigi3200071), レオン自動機株式会社 (栃&#... Read More

INTERNATIONAL PATENT: FUJIKURA LTD., 株式会社フジクラ FILES APPLICATION FOR "OPTICAL COMMUNICATION SYSTEM FOR QUANTUM COMPUTER, QUANTUM COMPUTER AND METHOD FOR MANUFACTURING QUANTUM COMPUTER"

GENEVA, Dec. 30 -- FUJIKURA LTD. (1-5-1, Kiba, Koto-ku, Tokyo1358512), 株式会社フジクラ (東京都江東区木&#22580... Read More

INTERNATIONAL PATENT: AGC INC., ＡＧＣ株式会社 FILES APPLICATION FOR "CROSSLINKED RUBBER ARTICLE AND FLUORINE-CONTAINING COPOLYMER COMPOSITION"

GENEVA, Dec. 30 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), ＡＧＣ株式会社 (東京都千代田区&#200... Read More

INTERNATIONAL PATENT: JSR CORPORATION, ＪＳＲ株式会社 FILES APPLICATION FOR "RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, COMPOUND AND POLYMER"

GENEVA, Dec. 30 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), ＪＳＲ株式会社 (東京都港区東... Read More

INTERNATIONAL PATENT: NIPPON STEEL CORPORATION, 日本製鉄株式会社 FILES APPLICATION FOR "STEEL MEMBER AND STEEL SHEET"

GENEVA, Dec. 30 -- NIPPON STEEL CORPORATION (6-1, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008071), 日本製鉄株式会社 (東京都千&#201... Read More

INTERNATIONAL PATENT: YAMASA CORPORATION, ヤマサ醤油株式会社 FILES APPLICATION FOR "METHYLTRANSFERASE FOR METHYLATION OF RIBOSE HYDROXYL GROUP IN 1ST AND 2ND NUCLEOTIDES FROM 5' END OF RNA, METHYLATION METHOD, USE OF METHYLTRANSFERASE AND KIT"

GENEVA, Dec. 30 -- YAMASA CORPORATION (10-1,Araoicho 2-chome,Choshi-shi, Chiba2880056), ヤマサ醤油株式会社 (千葉県銚&#2337... Read More

INTERNATIONAL PATENT: FUJIKURA LTD., 株式会社フジクラ FILES APPLICATION FOR "OPTICAL COMMUNICATION SYSTEM FOR QUANTUM COMPUTER, QUANTUM COMPUTER AND METHOD FOR MANUFACTURING QUANTUM COMPUTER"

GENEVA, Dec. 30 -- FUJIKURA LTD. (1-5-1, Kiba, Koto-ku, Tokyo1358512), 株式会社フジクラ (東京都江東区木&#22580... Read More

INTERNATIONAL PATENT: FUJIFILM CORPORATION, 富士フイルム株式会社 FILES APPLICATION FOR "ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD"

GENEVA, Dec. 30 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京都... Read More

INTERNATIONAL PATENT: KYOCERA CORPORATION, 京セラ株式会社 FILES APPLICATION FOR "CELL STACK DEVICE AND ELECTROCHEMICAL DEVICE"

GENEVA, Dec. 30 -- KYOCERA CORPORATION (6, Takeda Tobadono-cho, Fushimi-ku, Kyoto-shi, Kyoto6128501), 京セラ株式会社 (京都府京都... Read More

INTERNATIONAL PATENT: FUJIFILM CORPORATION, 富士フイルム株式会社 FILES APPLICATION FOR "ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD"

GENEVA, Dec. 30 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京都... Read More

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