Japan Intellectual Property Rights: WASHING COMPOSITION, WASHING METHOD OF FILM FORMATION COATING DEVICE, PRODUCTION METHOD OF SUBSTRATE FOR LITHOGRAPHY, AND RESIST PATTERN FORMATION METHOD

Japan, Jan. 20 -- TOKYO OHKA KOGYO CO LTD has got intellectual property rights for 'WASHING COMPOSITION, WASHING METHOD OF FILM FORMATION COATING DEVICE, PRODUCTION METHOD OF SUBSTRATE FOR LITHOGRAPHY, AND RESIST PATTERN FORMATION METHOD.' Other related details are as follows:

Application Number: JP,2021-096045

Category (FI): C11D7/26,H10P76/00,564,G03F7/16,501,H01L21/30,564,G03F7/039,601

Stage: Grant (IP right granted following substantive examination.)

Filing Date: June 8, 2021

Publication Date: Dec. 20, 2022

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....