Japan, Nov. 17 -- CARL ZEISS SMT GMBH has got intellectual property rights for 'SYSTEM AND METHOD FOR INSPECTING MASK FOR EUV LITHOGRAPHY.' Other related details are as follows:
Application Number: JP,2024-101467
Category (FI): G03F1/22,G03F1/84
Stage: Grant (IP right granted following substantive examination.)
Filing Date: June 24, 2024
Publication Date: Oct. 29, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....