Japan, Feb. 12 -- TOKYO ELECTRON LTD has got intellectual property rights for 'SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS.' Other related details are as follows:
Application Number: JP,2022-048255
Category (FI): H01L21/68@A,H01L21/302,101@G,H10P50/20,101@G,H10P72/30@A
Stage: Grant (IP right granted following substantive examination.)
Filing Date: March 24, 2022
Publication Date: Oct. 5, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....