Japan, Jan. 28 -- WONIK IPS CO LTD has got intellectual property rights for 'SUBSTRATE TREATMENT METHOD, AND SUBSTRATE TREATMENT APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME.' Other related details are as follows:

Application Number: JP,2023-112331

Category (FI): C23C16/455,C23C16/52

Stage: Grant (IP right document published.)

Filing Date: July 7, 2023

Publication Date: Aug. 25, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....