Japan Intellectual Property Rights: SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING SYSTEM, AND PROGRAM

Japan, Jan. 28 -- KOKUSAI ELECTRIC CORP has got intellectual property rights for 'SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING SYSTEM, AND PROGRAM.' Other related details are as follows:

Application Number: JP,2022-152708

Category (FI): H01L21/316@X,H10P50/20,201@A,H10P14/692@X,H10P14/60,101@B,H01L21/302,201@A,C23C16/02,H01L21/31@B

Stage: Grant (IP right document published.)

Filing Date: Sept. 26, 2022

Publication Date: April 5, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....