Japan, Jan. 20 -- NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY has got intellectual property rights for 'SOLID ELECTRODE LAYER AND MANUFACTURING METHOD THEREOF.' Other related details are as follows:
Application Number: JP,2022-094006
Category (FI): H01M4/525,H01M4/131,H01M4/36@E,H01M4/505,H01M10/0562,H01M4/136,H01M4/58,H01M4/1391,H01M4/1397,H01M10/0525
Stage: Grant (IP right document published.)
Filing Date: June 9, 2022
Publication Date: Dec. 21, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
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