Japan Intellectual Property Rights: PATTERN FORMATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND PATTERN FORMATION DEVICE

Japan, Jan. 28 -- KIOXIA CORP has got intellectual property rights for 'PATTERN FORMATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND PATTERN FORMATION DEVICE.' Other related details are as follows:

Application Number: JP,2022-044426

Category (FI): B29C59/02@Z,H01L21/30,502@D,H01L21/30,502@M,H01L21/30,564@Z,H01L21/68@N,H10P72/70,H10P76/00,564@Z,H10P76/00,600

Stage: Grant (IP right document published.)

Filing Date: March 18, 2022

Publication Date: Sept. 29, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....