Japan, Nov. 7 -- KATEEVA INC has got intellectual property rights for 'METHOD FOR PRODUCING ETCH RESIST PATTERN ON METALLIC SURFACE.' Other related details are as follows:
Application Number: JP,2024-004871
Category (FI): H05K3/06@F,B05D1/26@Z,B05D1/32@Z
Stage: Grant (IP right document published.)
Filing Date: Jan. 16, 2024
Publication Date: April 2, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
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