Japan Intellectual Property Rights: METHOD FOR DETERMINING SAMPLING SCHEME, SEMICONDUCTOR SUBSTRATE MEASUREMENT APPARATUS, AND LITHOGRAPHIC APPARATUS

Japan, Oct. 30 -- ASML NETHERLANDS BV has got intellectual property rights for 'METHOD FOR DETERMINING SAMPLING SCHEME, SEMICONDUCTOR SUBSTRATE MEASUREMENT APPARATUS, AND LITHOGRAPHIC APPARATUS.' Other related details are as follows:

Application Number: JP,2024-107925

Category (FI): H01L21/66@J,G03F9/00@H,G03F7/20,521,G03F7/20,501

Stage: Grant (IP right document published.)

Filing Date: July 4, 2024

Publication Date: Oct. 8, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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