Japan, Nov. 7 -- D2S INC has got intellectual property rights for 'METHOD AND SYSTEM FOR DETERMINING CHARGED PARTICLE BEAM EXPOSURE FOR LOCAL PATTERN DENSITY.' Other related details are as follows:

Application Number: JP,2024-065404

Category (FI): H01J37/305@B,H01L21/30,541@M,G03F7/20,504

Stage: Grant (IP right document published.)

Filing Date: April 15, 2024

Publication Date: July 25, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....