Japan, Jan. 28 -- HOYA CORP has got intellectual property rights for 'MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE.' Other related details are as follows:
Application Number: JP,2022-057867
Category (FI): G03F1/32
Stage: Grant (IP right document published.)
Filing Date: March 31, 2022
Publication Date: Oct. 13, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....